Free standing pyrolytic boron nitride (PBN) is fabricated by the well-known chemical vapor deposition process in which the ammonia gas (NH3) and a gaseous boron halide such as boron trichloride (BCl3) are reacting in a high temperature CVD furnace to deposit PBN on an appropriate substrate such as Pyrolytic Graphite.
PBN is known as an excellent choice for high-temperature furnace and electrical components, semiconductor and microwave components, and also free-standing crucibles for fabrication of single and binary compounds crystals such as germanium (Ge), gallium arsenide (GaAs), and indium phosphate (InP) owing to its intrinsic purity, superior mechanical properties, and physico-chemical stability.
Due to its high structural stability, Acids, alkalis, organic solvents, molten metals, and graphite do not react with PBN. PBN can withstand at 1800° C in vacuum and 2000° C in nitrogen, introducing it as a good choice for furnace components and melting vessels.
PBN crucibles for Vertical Gradient Freezing (VGF) process,
PBN crucibles for Liquid encapsulation Czochralski (LEC) process,
PBN crucibles for Vertical and Horizontal Bridgman process,
PBN containers for Molecular Beam Epitaxy (MBE) process,
and PBN boats for compound semiconductors and alloys processing
PBN Metal-Organic CVD (MOCVD) insulation boards and MBE insulation rings,
PBN electrical insulating bushings for high-temperature vacuum equipment,
and PBN Traveling Wave Tube (TWT) with spiral structure.
Layered structure with hexagonal crystal lattice
Special properties perpendicular to the basal plane of the crystal
Superior structural and physico-chemical stability
Anisotropic structure
High thermal stability
Non-wetting
Non-toxic